Facilities
- We have access for the following equipments
Fabrication Facilities
- ALD system
- Multi pocket e-beam/thermal deposition system
- Multi-target sputter deposition system
- FIB System [CICFAR]
- 2 PLD systems, 1 PLD/ MBE
- Ion milling/PVD system
- Rapid thermal annealing [COE]
- Silicon processing: 8 Inch Fab (400 sq.m Clean room)[SNDL]
- FIB System [CICFAR]
- Electron beam lithography [ISML]
- Scanning Electron microscope (SEM) [ISML]
- AFM/MFM
- Optical microscope
- Sub-nm (0.4nm) Helium ion microscope for imaging and lithography
- MeV Van De Graff for Rutherford backscattering and channeling analysis
- MeV Pelletron for RBS/Channeling and variable temperature channeling system
- Synchrotron radiation covering spectroscopy from XRay to IR [SSLS]
- XRD (State of the art Brucker system with 2D detector for pole plot)
- UV-Vis Spectrophotometer
- UV-IR Photoluminescence System [COE]
- Solar Cell Simulator/ Evaluator
- Fs/Ps Laser spectroscopy Labs for pump-probe measurements
- 2 Dilution refrigerators
- 2 He4 variable temperature transport measurement systems
- MPMS system (SQUID)
- PPMS
- Multi pin probe station (pogo)
- High frequency characterization probe station (50 GHz)