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IEEE, Member SPIE, Member ICS, Member
Control, Signal Processing, Simulation and Optimization for Semiconductor Manufacturing Design for Manufacturing Lithography Process Control Fault Detection and Monitoring Computational Intelligence
1. Control and Modeling of Chemical Mechanical Polishing Funding: S$80K (NUS) (1/02 -- 1/05) Collaborators: Arthur Tay (PI), A Mamun, WK Ho 2. Development of Integrated Bake/Chill System Funding: ~S$800K (SIMTech-NUS) (1/02 -- 1/05) Collaborators: AP Loh (PI), WW Tan, WK Ho, KW Lim and Arthur Tay (all NUS); ZM Gong, SL Chow (all SIMTech) 3. End-point Monitoring and Control for the Photoresist Development Process Funding: ~S$1M, Institute of Chemical and Engineering Science (ICES)-NUS-Georgia Tech (1/03 -- 1/06) Collaborators: Arthur Tay (PI), WK Ho, CC Hang, KW Lim, AP Loh, WW Tan, Y Zhou (ICES) and Jay Lee (Georgia Tech) 4. A Framework for Intelligent Process Monitoring/Process Supervision Funding: S$738,000, ICES, (10/02 -- 10/05) Collaborators: KW Lim (PI), WK Ho, R Srivisan, KC Tan, Arthur Tay, J Liu (ICES) and J Romagonli (U Sydney) 5. In-Situ Measurement and Control in the Microlithography Process Funding: ~S$1.5M, A*Star, SIMTech and NUS (4/04 -- 4/07) Collaborator: WK Ho (PI), Arthur Tay (co-PI), AP Loh, WW Tan (all NUS) and XQ Chen (co-PI, SIMTech) 6. Real-time Monitoring and Control of Critical Dimension in Microlithography Funding: ~S$570K, A*Star PSF (1/07 -- 1/10) Collaborator: Arthur Tay (PI), KK Tan (co-PI), and ZP Fang (SIMTech) 7. Teaching Enhancement Grant: Development of Mobile Real-time Feedback/Teaching Systems. Funding: ~S$8K (Sept 07 - July 08) Collaborators: Arthur Tay (PI), KK Tan (PI)
T. Kailath and A. Tay, "Extending the Life of Optical Lithography," INNOVATION, 2(3), 2001. A. Tay, W.K. Ho, A.P. Loh, K.W. Lim, W.W. Tan and C. Schaper, "Integrated Bake/Chill Module with In-situ Temperature Measurement for Photoresist Processing" IEEE Transactions Semiconductor Manufacturing, 17(2), 2004. A. Tay, W.K. Ho, N. Hu and XQ Chen, "Estimation of wafer warpage profile during thermal processing in microlithography", Review of Scientific Instruments, 76(7), 2005. A Tay, HT Chua, XD Wu, "A Lamp Thermoelectricity Based Integrated Bake/Chill System for Photoresist Processing". International Journal of Heat & Mass Transfer, 50(3-4), 2007. A Tay, WK Ho, XD Wu, "Real-time Control of Photoresist Extinction Coefficient Uniformity in Microlithography", IEEE Transaction Control Systems Technology, 15(1), 2007. A Tay, WK Ho, N Hu, "An in-situ Approach to Real-time Spatial Control of Steady-state Wafer Temperature during Thermal Processing in Microlithography", IEEE Transaction Semiconductor Manufacturing, 20(1), 2007. A Tay, TW Ng, YH Wang and S Zhao, "Direct Measurement of Beam Size in a Spectroscopic Ellipsometry Setup", Review of Scientific Instruments, 79(6), 2008.
PhD: Kiew Choon Meng (AGS): 03-07 Hu Ni: 03-07 Wu Xiaodong: 03-07 Wang Yuheng: 04-08 Chen Ming: 04-08 Quek Han Yang: 05-10 Tan Chin Hiong: 06- Teh Siew Hong: 07- Ngo Yit Sung: 08- Yang Rui: 08- Yang Geng: 08- Ang Kar Tien: 10- Henry Tan: 10- MEng: Cai Ji: 01-02 Xu Huan: 01-03 Deng Jiewen: 01-03 Li Da: 01-03 Varadarajan Ganesh Kumar: 01-03 Yang Kai: 02-04 Joe YenYen (ICES): 02-04
Teaching Commendation Award 2002/2003, 2003/2004, 2004/2005, 2006/2007, 2007/2008 Teaching Honours List 2008/2009 Teaching Enhancement Grant 2007 17th Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference 2006, Boston, USA. Best Student Paper Award (Kiew Choon Meng) 2007 Advanced Equipment Control/Advanced Process Control Symposium, California, USA. Best Student Paper Prize (honorable mention) (Cheng Ming)
Current: EE2010 System and Control Previous: EE4302 Advanced Control Systems EE5103/ME5403 Computer Control Systems MCH5206 Instrumentation and Sensors EE5204 Servo Engineering Tutorial: EE2010 Systems and Control EE2010E Systems and Control