SEMINAR  ANNOUNCEMENT

 

Department of Electrical and Computer Engineering

National University of Singapore

4 Engineering Drive 3, Singapore 117576

Tel: (65) 65162109   Fax: (65) 67791103

Website:  http://www.ece.nus.edu.sg

 

 

Organised by

Centre for Optoelectronics

 

2 June 2009 (Tuesday)

E3-06-12, Engineering block E3, NUS

 

TOPIC (1) :

An Improved Autocorrelation Technique Based on the Degree-of-Polarization Measurement

SPEAKER (1)

 

Mr.Hu Junhao, Graduate Student

Dept of Electrical & Computer Engineering, NUS

TIME (1) :

2.00 pm  to  2.40 pm

ABSTRACT (1) :

 

Based on Degree-of-Polarization (DOP) measurement, we demonstrate an auto-correlation technique to measure the pulse width of optical short pulse with a resolution of 0.01 ps.

 

The impacts of chirp and alignment of polarization will be discussed in details.

Our experimental measurement results of six pulse trains with different pulse widths from mode-locked laser are consistent with the conventional second-harmonic generation (SHG) autocorrelation will also be discussed in this seminar.

BIOGRAPHY (1)

Mr.Hu Junhao obtained his Bachelor’s of Electrical Engineering from the Huazhong University of Science and Technology in China in 2007. Since then, he has been working towards his Ph.D. degree in Electrical & Computer Engineering Department, NUS as a research scholar. His current research interests are high speed fiber optic communication.

 

TOPIC (2) :

Nanoscale Arrays of Lithium Niobate Fabricated by Interference Lithography and Dry Etching

SPEAKER (2)

 

Mr. Si Guangyuan, Graduate Student

Dept of Electrical & Computer Engineering, NUS

TIME (2):

2.50 pm  to  3.40 pm

ABSTRACT (2) :

 

The Channel waveguides have been fabricated in x-cut lithium niobate (LiNbO3) by proton exchange (PE) method and optical measurement results will be introduced.

 

The thickness and the optical constants of the thin PE layer were characterized using a prism coupling technique. The PE area was plasma etched to achieve a 2.775-μm total etching depth and average etching rate is 92.5 nm/min. The experimental results and detail will be presented.

One- and two-dimensional dense arrays of LiNbO3 nanostructures have also been fabricated by using interference lithography (IL) and inductively coupled plasma reactive ion etching (ICP-RIE) techniques will also present in this talk.

BIOGRAPHY (2)

Mr. Si Guangyuan received his BSc degree from Department of Electronic Science and Technology, University of Science and Technology of China in 2007. He is currently pursuing a PhD degree in Department of Electrical and Computer Engineering, National University of Singapore. His research is mainly focused on optical waveguide fabrication and characterization.

 

Please register with Ms Diana Ng of ECE Dept by Tel: 6516 2109;  Fax: 6779 1103; or Email: diana_ng@nus.edu.sg

ECE seminar webpage: http://www.ece.nus.edu.sg/events/seminars/seminar2611new.asp