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TOPIC (1) : |
An Improved Autocorrelation Technique
Based on the Degree-of-Polarization
Measurement |
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SPEAKER (1) |
Mr.Hu Junhao, Graduate Student
Dept of Electrical & Computer Engineering,
NUS |
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TIME (1) : |
2.00 pm to 2.40 pm |
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ABSTRACT (1) : |
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Based on Degree-of-Polarization (DOP)
measurement, we demonstrate an
auto-correlation technique to measure the
pulse width of optical short pulse with a
resolution of 0.01 ps.
The impacts of chirp and alignment of
polarization will be discussed in details.
Our experimental measurement results of
six pulse trains with different pulse
widths from mode-locked laser are
consistent with the conventional
second-harmonic generation (SHG)
autocorrelation
will also be discussed in this seminar. |
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BIOGRAPHY (1) |
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Mr.Hu Junhao obtained his Bachelor’s of
Electrical Engineering from the Huazhong
University of Science and Technology in
China
in 2007. Since then, he has been working
towards his Ph.D. degree in Electrical &
Computer Engineering Department,
NUS
as a research scholar. His current
research interests are high speed fiber
optic communication.
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TOPIC (2) : |
Nanoscale Arrays of Lithium Niobate
Fabricated by Interference Lithography and
Dry Etching |
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SPEAKER (2) |
Mr. Si Guangyuan,
Graduate Student
Dept of Electrical & Computer Engineering,
NUS |
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TIME (2): |
2.50 pm to 3.40 pm |
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ABSTRACT (2) : |
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The Channel waveguides have been
fabricated in x-cut lithium niobate (LiNbO3)
by proton exchange (PE) method and optical
measurement results will be introduced.
The thickness and the optical constants
of the thin PE layer were characterized
using a prism coupling technique. The PE
area was plasma etched to achieve a 2.775-μm
total etching depth and average etching
rate is 92.5 nm/min. The experimental
results and detail will be presented.
One- and two-dimensional dense arrays of
LiNbO3 nanostructures have also
been fabricated by using interference
lithography (IL) and inductively coupled
plasma reactive ion etching (ICP-RIE)
techniques will also present in this talk. |
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BIOGRAPHY (2) |
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Mr. Si Guangyuan received his BSc degree
from Department of Electronic Science and
Technology, University of Science and
Technology of China in 2007. He is
currently pursuing a PhD degree
in Department of Electrical and Computer
Engineering, National University of
Singapore. His research is mainly focused
on optical waveguide fabrication and
characterization.
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