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The center’s facilities, expertise and continuing research efforts would enhance the capability of
the Centre to produce a wider range of Optoelectronic devices and Nano-photonics technology.
. Molecular Beam Epitaxy (MBE) System Metal-Organic Chemical Vapor Deposition (MOCVD) systems
.
Molecular Beam Epitaxy (MBE) System
Metal-Organic Chemical Vapor Deposition (MOCVD) systems
CHARACTERIZATION EQUIPMENTS
Low temp- photoluminescence set-up Low temp-micro photoluminescence set-up MRD-High Resolution X-ray Diffraction System Alpha step surface profiler
Low temp- photoluminescence set-up
Low temp-micro photoluminescence set-up
MRD-High Resolution X-ray Diffraction System
Alpha step surface profiler
Diffusion and alloying furnaces Rapid thermal processor (RTP) Inductively Coupled Plasma etching system (ICP) Electron beam metallisation systems Photolithographic equipments Facilities for wafer processing in a clean room environment.
Diffusion and alloying furnaces
Rapid thermal processor (RTP)
Inductively Coupled Plasma etching system (ICP)
Electron beam metallisation systems
Photolithographic equipments
Facilities for wafer processing in a clean room environment.
Charges for usage of facilities - Equipment Charges
Tracking for usage of facilities - Equipment Usage Form Application for usage of facilities - Application Form
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