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The center’s facilities, expertise and continuing research efforts would enhance the capability of
the Centre to produce a wider range of Optoelectronic devices and Nano-photonics technology.
. Molecular Beam Epitaxy (MBE) System Metal-Organic Chemical Vapor Deposition (MOCVD) systems
.
Molecular Beam Epitaxy (MBE) System
Metal-Organic Chemical Vapor Deposition (MOCVD) systems
CHARACTERIZATION EQUIPMENTS
Low temp- photoluminescence set-up Low temp-micro photoluminescence set-up MRD-High Resolution X-ray Diffraction System Alpha step surface profiler
Low temp- photoluminescence set-up
Low temp-micro photoluminescence set-up
MRD-High Resolution X-ray Diffraction System
Alpha step surface profiler
Thermal Annealing Unit Inductively Coupled Plasma etching system (ICP) Electron beam metallisation systems Photolithographic equipments Facilities for wafer processing in a clean room environment.
Thermal Annealing Unit
Inductively Coupled Plasma etching system (ICP)
Electron beam metallisation systems
Photolithographic equipments
Facilities for wafer processing in a clean room environment.
Charges for usage of facilities - Equipment Charges
Tracking for usage of facilities - Equipment Usage Form Application for usage of facilities - Application Form
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